G05200 - SEMI G52 - Test Method for Measurement of Ionic Contamination on Semiconductor Leadframes Revision:SEMI G52-1120 - Current SEMI M57-0305 (complete rewrite)

SEMI M57-0305 (complete rewrite)

Capacity tests are done by adding ppm levels of a given gaseous impurity to a pure zero gas and monitoring the effluent of the test purifier for active impurity species

Control of parameters such as bonded wafer stack (BWS) thickness

and proof pressure of pressure transducers with a full pressure range of 2757

SEMI E16-90 (Reapproved 0699)

G05200 - SEMI G52 - Test Method for Measurement of Ionic Contamination on Semiconductor Leadframes Revision:SEMI G52-1120 - Current SEMI M57-0305 (complete rewrite)Contamination on leadframes can contribute to semiconductor device reliability problems. This Test Method may be used by lead frame manufacturers at outgoing inspection and by users at incoming inspection. Correlation of device reliability with contamination levels may lead to improved leadframe cleaning processes. This Standard describes the procedure to determine ionic contamination on leadframes using a water extraction method. The method is