E14600 - SEMI E146 - Test Method for the Determination of Particulate Contamination from Minienvironments used for Storage and Transport of Silicon Wafers Revision:SEMI E146-0306 - Inactive Nonuniformity of the surface leads

Nonuniformity of the surface leads to nonuniform oxide on a wafer and causes degradation of the oxide breakdown voltage

Standardized specifications for Si feedstock materials are expected to reduce these interface problems and to enable a common understanding of material properties and terms

環境，健康，安全（EHS）に関する熟達度の必要最低限レベルを実証するために必要な特定の学習目標を確立すること。

18 — Specification for Sensor/Actuator Specific Device Model for Vacuum Pump Device

lower space requirement

E14600 - SEMI E146 - Test Method for the Determination of Particulate Contamination from Minienvironments used for Storage and Transport of Silicon Wafers Revision:SEMI E146-0306 - Inactive Nonuniformity of the surface leadsNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. This Standard defines a test method for the determination of particulate contamination from minienvironments used for storage and transport of silicon wafers in semiconductor manufacturing. The particulate contamination