P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様 Revision:SEMI P45-0708 - Superseded and communication of thin film

and communication of thin film data is consistent among various parties who may need to concur on interpretation of the results of a thin film fabrication-process step

本スタンダードで指定する権限付与スキームにより，装置ベンダーは，アクセス管理制限無しから，定義済みの役割ベースのアクセス管理，非常にきめの細かい管理まで任意のレベルの細かさでアクセスを管理する柔軟性を提供できる。

Support assignment of Persons to factory jobs and monitor and record job progress (from the perspective of the Person’s role)

1996년 12월에 최초 간행되었으며 2010년 5월에 출판되었다

This Specification defines the space necessary within a tool with respect to the interface plane

P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様 Revision:SEMI P45-0708 - Superseded and communication of thin filmglobal Micropatterning Committee2008513global Audits and Reviews Subcommittee20086www. semi. org20087CD ROM20063 MALY Referenced SEMI Standards SEMI P39 OASISTM Open Artwork System Interchange Standard SEMI P44 Specification for Open Artwork System Interchange Standard (OASISTM) Specific to Mask Tools