T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass Wafer Figure 1은 GEM

Figure 1은 GEM

Current edition approved by the North American Regional Standards Committee on August 28

This Document describes the procedure for determination of the moisture dry-down characteristics (quantity of removable moisture) of surface mount (integrated gas delivery systems) and conventional gas delivery systems using cavity ring down spectroscopy (CRDS) analyzers

It is not intended to distinguish good from bad or desirable from undesirable

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T01600 - SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks StdTpc-Glass Wafer Figure 1은 GEMThis Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks. This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two dimensional, machine readable, Data Matrix symbols for pattern surface marking of resist coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38. This Specification