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F03700 - SEMI F37 - ガス供給システム構成部品の表面粗さパラメータの算出方法 Revision:SEMI F37-0299 (Reapproved 0611) - Superseded SEMI MF2074-0912 (Reapproved 0718)

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SEMI MF2074-0912 (Reapproved 0718)

3  This Test Method describes methods for preparation of slices and wafers of the III-V compound semiconductors GaAs

SEMI M34 — Guide for Specifying SIMOX Wafers

Hydrogen fluoride is a highly toxic

and GaP with {100} or {111} surfaces by structural etching

F03700 - SEMI F37 - ガス供給システム構成部品の表面粗さパラメータの算出方法 Revision:SEMI F37-0299 (Reapproved 0611) - Superseded SEMI MF2074-0912 (Reapproved 0718)global Gases Committee2011513global Audits and Reviews Subcommittee20116www. semiviews. org www. semi. org19992200411 : Referenced SEMI Standards None.

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