P00300 - SEMI P3 - Specification for Photoresist/E-Beam Resist for Hard Surface Photoplates Revision:SEMI P3-0308 - Inactive SEMI E154 — Mechanical Interface

SEMI E154 — Mechanical Interface Specification for 450mm Load Port

orgで，そして2008年3月にCD-ROMで入手可能となる。初版は2003年7月発行，前版は2007年11月に発行された。

and specimen surface preparation specified in this Test Method are to be preferred for all referee measurements on bulk silicon wafers

This Test Method applies only for 3-point bending method

This Document covers requirements for bulk silane (SiH4) used in the semiconductor industry

P00300 - SEMI P3 - Specification for Photoresist/E-Beam Resist for Hard Surface Photoplates Revision:SEMI P3-0308 - Inactive SEMI E154 — Mechanical InterfaceNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This Document was completely rewritten in 2008. This Specification covers the general requirements on the photoresist and e beam resist coating for hard surface photoplates. See SEMI P1 and SEMI P2 for requirements