F01400 - SEMI F14 - Guide for the Design of Gas Source Equipment Enclosures volume-C このマーキングシンボルは，ユーザのパターンプロセスに影響しない方法と位置でマークされる。

このマーキングシンボルは，ユーザのパターンプロセスに影響しない方法と位置でマークされる。

This Specification allows growth methods that include Czochralski (Cz) method

This Standard covers requirements for ammonia used in the semiconductor industry

SEMI MF1630-1107 (Reapproved 0718)

SEMI M1-0309E (editorial revision)

F01400 - SEMI F14 - Guide for the Design of Gas Source Equipment Enclosures volume-C このマーキングシンボルは，ユーザのパターンプロセスに影響しない方法と位置でマークされる。This standard was technically reapproved by the global Facilities Committee and is the direct responsibility of the North American Facilities Committee. Current edition approved by the North American Regional Standards Committee on December 18, 1998. Initially available on www. semi. org February 1999; to be published June 1999. Originally published in 1993. Editorial changes were made to 3. 1. 1, 6. 2. 1, and 6. 2. 2. This document summarizes gas