M01400 - SEMI M14 - Specification for Ion Implantation and Activation Process for Semi-Insulating Gallium Arsenide Single Crystals Revision:SEMI M14-89 - Inactive NOTICE: This Standard was completely

NOTICE: This Standard was completely rewritten in 2024

This Standard applies to "Specifications for Dimension of Components for Surface Mount Gas Distribution Systems" (SEMI F82

Silicon (Si) wafers for PV applications cut from a Si ingot or Si brick contain a variety of micro- and macroscopic crystallographic defects and flaws that may impact the efficiency of a solar cells or the yield of a manufacturing line

org in May 2015

and equipment and process development activities

M01400 - SEMI M14 - Specification for Ion Implantation and Activation Process for Semi-Insulating Gallium Arsenide Single Crystals Revision:SEMI M14-89 - Inactive NOTICE: This Standard was completelyThe purpose of this document is to present a process for ion implantation, activation, and measurement of the resulting layers so that meaningful comparisons can be made between various lots of semi insulating GaAs. This test will be performed by the supplier so that product may be represented in a standard way. Referenced SEMI Standards None.