C02900 - SEMI C29 - 4.9%フッ化ケイ素酸（10:1 V/V）の仕様とガイドライン StdPbc-0925 安全管理人協調委員會（SSCC）

安全管理人協調委員會（SSCC）

suitable sampling techniques must be employed

SEMI MF95 — Test Method for Thickness of Lightly Doped Silicon Epitaxial Layers on Heavily Doped Silicon Substrates Using a Dispersive Infrared Spectrophotometer

to be published July 2003

The residual stress of a thin film layer is calculated in this Test Method based on the Young’s modulus value also obtained in this Test Method

C02900 - SEMI C29 - 4.9%フッ化ケイ素酸（10:1 V/V）の仕様とガイドライン StdPbc-0925 安全管理人協調委員會（SSCC）Global Process Chemicals CommitteeNorth American Process Chemicals Committee19991017North American Regional Standards Committee20012www. semi. org20013SEMI C7. 4C8. 4C12. 319901992199519996 4. 9%4. 9%10: 1 V V 4. 9% Referenced SEMI Standards SEMI C28 Specifications and Guidelines for Hydrofluoric Acid