F07700 - SEMI F77 - 腐食性のガスシステムに使用される合金表面の電気化学的臨界孔食温度のテスト方法 StdPbc-0309 The oxygen concentration obtained using

The oxygen concentration obtained using this Test Method assumes a linear relationship between the interstitial oxygen concentration and the absorption coefficient of the 1107 cm1 band associated with interstitial oxygen in silicon

Boron-Doped

Deep reactive ion etching (DRIE) is widely used in MEMS fabrication processes for creating high-aspect ratio anisotropic features

SEMI D74-0116 (first published)

This Document describes a set of etch test structures for characterizing the performance of DRIE process tools

F07700 - SEMI F77 - 腐食性のガスシステムに使用される合金表面の電気化学的臨界孔食温度のテスト方法 StdPbc-0309 The oxygen concentration obtained usingglobal Gases Committee20091216global Audits and Reviews Subcommittee20102www. semi. org20037 CPT ASTM G150 4. 1SEMI 4. 1 Referenced SEMI Standards None.