T01400 - SEMI T14 - Specification for Micro ID on 300 mm Silicon Wafers StdVol-Microlithography SEMI D21 — Terminology for

SEMI D21 — Terminology for FPD Mask Pattern Accuracy

because this Test Method is independent of the metal's chemistry or electrical activity

Non-Member $1095       $995

SEMI T11-0703 (Reapproved 0709)

Non-Member      $1395  $1295

T01400 - SEMI T14 - Specification for Micro ID on 300 mm Silicon Wafers StdVol-Microlithography SEMI D21 — Terminology forThis specification was technically approved by the global Traceability Committee and is the direct responsibility of the Japanese Traceability Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www. semi. org September 2004; to be published November 2004. NOTICE: The designation number of T14 was updated during the 0705 cycle to reflect the creation of T14. 1. The purpose of this