M03800 - SEMI M38 - 鏡面リクレイムシリコンウェーハの仕様 Revision:SEMI M38-0312 - Superseded This Specification provides for a

This Specification provides for a standardized OC location in support of future unification of the OC cut shape as well as location

This Standard defines a physical/data link layer based on Ethernet

and microfluidic devices including valves and pumps

With growing aspect ratio of a wafer (e

This includes process

M03800 - SEMI M38 - 鏡面リクレイムシリコンウェーハの仕様 Revision:SEMI M38-0312 - Superseded This Specification provides for aglobal Silicon Wafer Committee20061121global Audits and Reviews Subcommittee20072www. semi. org20073CD ROM1999920063 300 mm 1 Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M8 Specification for Polished Monocrystalline Silicon Test Wafers SEMI M18 Format for Silicon Wafer Specification Form for Order Entry