Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US Al we can modify your tube

we can modify your tube furnace into evaporating coater

Kerr's Research Group from the Lawrence Berkeley National Laboratory (LBL)

Make sure to inspect for defect(s) thoroughly before use

Width: 300mm

Two pushing rods highly polished and perfectly fitted into die

Al2O3 - Sapphire Wafer 3" x0.5 mm, A plane (11-20), 1 SP - ALA76D05C1US Al we can modify your tubeFeatures: A plane (11 20) sapphire wafer is being used extensively as a substrate for III V nitrides and magnetic epitaxial films due to its better lattice mismatch Wafer size: 3" dia x 0. 5 mm thickness Orientaion: A plane <11 20> ori.(+ 05o) with Standard Flat Polished surface: Wafer surface is EPI polished via a special CMP procedure Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container Typical