99" loading="eager" fetchpriority="high" decoding="async"/>
Thermal Oxide Wafer: 300 nm SiO2 Layer on Si (111), 3"dia x 0.50 mm t, N-type ,P-doped 1SP R:5-15 ohm.cm Fe crystal purity: >99
$121.69
Description
crystal purity: >99
Zirconia Milling Balls Combo:
040mm (+-0
Open area: ~55%
Dimension: 475 mm L x 255 mm W x 105 mm H
Thermal Oxide Wafer: 300 nm SiO2 Layer on Si (111), 3"dia x 0.50 mm t, N-type ,P-doped 1SP R:5-15 ohm.cm Fe crystal purity: >99Thermal oxide Layer Research Grade , about 80 % useful area SiO2 layer on 3" Silicon wafer Oxide layer thickness: 300 nm ( 3000A) + 10% Refractive index 1. 455 Silicon Wafer Specifications: Conductive type: N type P dped Resistivity: 5 15 ohm. cm (If you would like to measure the resistivity accurately, please order our Portable 4 Probe Resistivity Testing Instrument.) Size: 3" + 0. 5 mm in diameter x 0. 5 mm + 0. 05 mm th Orientation: (111) + 1o
Shipping Notes
- Free Standard Shipping on $100+ Orders to the USA.
- Except Preorder products are shipped in 48 hours.
- Delivery to the USA:
- Standard Shipping : 3-10 business days
- If time is of the essence, please consider selecting expedited delivery for faster service.
You may also like
US$ 25.90
US$ 32.00
US$ 152.92
US$ 45.00
US$ 85.00
US$ 30.00
US$ 175.00
US$ 130.00
US$ 27.02
US$ 11.00
US$ 65.00
US$ 60.00
US$ 37.87
US$ 22.20
US$ 171.65