Al2O3 - Sapphire Wafer, M plane, 0.5"x0.5"x0.5mm, 1 SP - ALM121205S1 Max. current +3 A Note: How to achieve finer

Note: How to achieve finer or desired particles via ball mill is a research project

Click the video below to see how to heat seal the tab onto the pouch cell case after the welding:

Thickness: 0

2mm or less in diameter(clear)

Sealed by MSK-510

Al2O3 - Sapphire Wafer, M plane, 0.5"x0.5"x0.5mm, 1 SP - ALM121205S1 Max. current +3 A Note: How to achieve finerFearures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 0. 5" x 0. 5" x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. M plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A 1 side polished Package: Each wafer is packed in 1000 class clean room with