ITO Coated Glass Substrate 1.0" x 3" x 1.1 mm,R: 100 ohm/sq, Nominal ITO film thickness: 30-35nm, Pb Orientaion: A plane <11-20> ori

Orientaion: A plane <11-20>  ori

Surface Polishing:           two sides  polished

3   in/in °F x 10 -6 5

Only works for coin cell fabrication

It is an excellent tool to prepare high-density compound pellets and a small-diameter rod

ITO Coated Glass Substrate 1.0" x 3" x 1.1 mm,R: 100 ohm/sq, Nominal ITO film thickness: 30-35nm, Pb Orientaion: A plane <11-20> oriIndium Tin Oxide (ITO) coated Glass Plates Dimension: 1" x 3" x 1. 1 mm Resistivity: 100+ 10 ohm sq Nominal ITO film thickness: 30 35 nm Optical Transparency: ~87 % @ 550 nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater