SrTiO3 (100) 0.25"x0.25"x0.5 mm Epi polished wafer 2 SP - STOa060605S2 BaF2 Small particles may slip into

Small particles may slip into the gap of the die parts and damages the sleeve during the compression

Please use alcohol to clean the pressing die every time before use and store it in a dry place with antirust oil after operation to avoid rusting on the surface

Polish:             two sides EPI polished with surface roughness  Ra< 5 A ( measured by AFM  5x5

Can be used for MTI as well as Buhler

It is widely used for slurry preparation of silicon-based anode material

SrTiO3 (100) 0.25"x0.25"x0.5 mm Epi polished wafer 2 SP - STOa060605S2 BaF2 Small particles may slip intoSrTiO3 single crystal provides a good lattice match to most materials with Perovskite structure. It is an excellent substrate for epitaxial growth of HTS and many oxide thin films. SrTiO3 single crystal has also been used widely for special optical windows and as high quality sputtering target. MTI has the full production line to manufacture first the high purity SrTiO3 powder, then the single crystal boules and finally the epi polished substrates in